Discover the Multi GIS for advanced electron and ion beam applications. Inject up to five gases for versatile metal and insulator deposition, enhancing your ZEISS microscope capabilities.
Boost Your Workflow with the Multi Gas Injection System
Key Takeaways
- Research focus: Multi Gas Injection System for enhanced deposition processes.
- Model system: ZEISS microscopes with FIB column.
- Research goal: Expand application opportunities in electron and ion beam lithography.
- Presented by: Carl Zeiss Microscopy GmbH.
- Content type: Product Overview for technical advancements.
And Convenient Handling
The Multi Gas Injection System (GIS) allows to inject a process gas on the specimen surface for electron beam- or ion beam induced
deposition of metals and insulators. The ion beam induced deposition requires a FIB column installed on the microscope.
Benefit from the possibility to inject up to five different process
gases. Choose between a variety of metal or non-metal materials,
required for many applications and work-flows e.g. Lithography
Extend your process opportunities by using specific precursor
EN_43_012_022 | CZ-12/2021 | Design, scope of delivery and technical progress subject to change without notice. | © Carl Zeiss Microscopy GmbH
Not for therapeutic use, treatment or medical diagnostic evidence. Not all products are available in every country. Contact your local ZEISS representative for more information.
Upgrade your ZEISS microscope with the Multi GIS upgrade and benefit from comfortable electron and ion beam deposition.
As technical requirements may apply on some systems, please contact us to learn more about the Multi GIS and how your
